inc. · · · ·
Technical alterations reserved (Date 1/99)
In order to meet these high requirements,
gases like oxygen, argon, helium or
nitrogen are filtered by the ultrafilter
ultrapure® – the pure gas filter R-EG and
its multilayered depthfilter medium R-TF.
Absolute retention rates of particles with
a size of only 0.01 µm guarantee a trouble-
free and a quantitatively consistent quality
of production.
Product description:
The ultrafilter ultrapure® pure gas filter
consists of a 316L stainless steel hou-
sing. The housing is electropolished from
the inside and has a surface finish of Ra =
20 µinch. Inside the housing features a
multilayer depthfilter,
a medium that provides an absolute reten-
tion of particles up to 0.01 µm.
The ultrapure® filter is prefered in the elec-
tronic industry as a point of use filter for
gases like oxygen, argon, helium or nitrogen.
The electronic industry’s requirements concerning the
purity of auxiliary materials are rising together with the
growing memory density and efficiency of the electronic
elements.
ultrapure® R-EG
Applications:
The ultrapure® point of use filter is designed and developed for the following
applications:
v photo paint
v ion donation
v oxidation/diffusion ovens
v wafer drying
v aerospace technology
v filtration of solvents
v gas supply and automatic
control systems
The ultrapure®
gas filter R-EG
with filter media R-TF
Please contact
Filter Products at 804-231-4646 to place an order or for more information about this product.
